No. |
Item |
Standard Specification |
||
Formula |
Purity |
Impurity PPM Max each |
||
1 |
Zinc Telluride |
ZnTe |
5N |
Mg/Cu/Ni/In/As/Al 0.5, Cd/Pb/Sn 1.0, Ag 0.2, Co 0.1 |
2 |
Arsenic Telluride |
As2Te3 |
4N 5N |
Available Upon Request.Special specification can be customized |
3 |
Antimony Telluride |
Sb2Te3 |
4N 5N |
|
4 |
Aluminum Telluride |
Al2Te3 |
4N 5N |
|
5 |
Bismuth Telluride |
Bi2Te3 |
4N 5N |
|
6 |
Copper Telluride |
Cu2Te |
4N 5N |
|
7 |
Cadmium Telluride |
CdTe |
5N 6N 7N |
|
8 |
Cadmium Zinc Telluride |
CdZnTe |
5N 6N 7N |
|
9 |
Cadmium Manganese Telluride |
CdMnTe |
5N 6N |
|
10 |
Gallium Telluride |
Ga2Te3 |
4N 5N |
|
11 |
Indium Telluride |
InTe |
4N 5N |
|
12 |
Lead Telluride |
PbTe |
5N |
|
13 |
Molybdenum Telluride |
MoTe2 |
3N5 |
|
14 |
Tungsten Telluride |
WTe2 |
3N5 |
|
15 |
Size |
-60/-80mesh, 1-20mm Lump, 1-6mm Granule, Target or Blank |
||
16 |
Packing |
In polyethylene bottle or composite bag, 1kg each. |
Indium Telluride InTe, 99.999% Molecular weight 242.4, density of 6.29 g/cm3 Melting point is 696 ℃ black or blue-gray crystal tetragonal crystal structure insoluble in hydrochloric acid, soluble in nitric acid by CVD chemical vapor deposition process, used in semiconductor industry, sensor parts, lens coating
Arsenic Telluride or Arsenic Ditelluride As2Te3, a group I-III binary compound, is in two crystallographic Alpha-As2Te3 and Beta-As2Te3, Among which Beta-As2Te3 with rhombohedral structure, exhibits interesting thermoelectric (TE) properties by adjusting the content of alloys. Polycrystalline Arsenic Telluride As2Te3 compound synthesized by powder metallurgy may be an interesting platform to design novel TE materials with high efficiency. Single crystals of As2Te3 is prepared hydrothermally by heating and gradually cooling a mixture of stoichiometric quantities of powdered As and Te in a HCl 25% w/w solution. It is mainly used as semiconductors, topological insulators, thermoelectric materials.
Gallium Telluride Ga2Te3, molecular weight 522.24, CAS 12024-27-0 is a hard and brittle black crystal with a melting point of 790℃ at 266.64pa, density 5.57g/cm3. Single crystal Gallium Telluride GaTe is developed by using different growth techniques such as Bridgman Growth, Chemical Vapor Transport (CVT), or Flux Zone Growth to optimize grain size, defect concentration, structural, optical, and electronic consistency. But Flux zone technique is a halide free technique used for synthesizing truly semiconductor grade vdW crystals, which distinguishes itself from Chemical Vapor Transport CVT technique to ensure slow crystallization for perfect atomic structuring, and impurity free crystal growth. Gallium telluride GaTe, is a layered semiconductor belonging to the III-VI metal. This layered crystal with two modifications, which are stable α-GaTe of a monoclinic and metastable β-GaTe of hexagonal in structure, good p-type transport properties, a direct band-gap of 1.67 eV in the bulk. The hexagonal phase converts to the monoclinic phase at high temperature. Layered semiconductors possesses a unique monoclinic structure, Gallium telluride, GaTe possesses interesting properties attractive for future opto-electronic applications.
Molybdenum Telluride or Molybdenum Ditelluride MoTe2, CAS No 12058-20-7, Formula Weight 351.14, is a gray hexagonal crystal solid compound. Molybdenite MoTe2 and Tetramolybdenite Mo3Te4 are stable in air and decompose in alkali, insoluble in water, soluble in nitric acid, decomposes but not melting at high temperature in vacuum. Molybdenum Telluride is synthesized in sealed vacuum tube at higher temperature by reacting of molybdenum and tellurium to form homogeneous compounds MoTe2 and Mo3Te4. Molybdenum Telluride is a crystal produced for solid lubricant or as a sputtering targets in semiconductor field.Tungsten Telluride or Tungsten Ditelluride WTe2, metal appearance, typical acicular and rectangular shape, CAS No.12067-76-4, stable in ambient conditions, is a type-II Weyl semimetal WSM, belongs to group VI transition metal dichalcoride TMDC with physical, electronic and thermodynamic properties that make it attractive for a variety of electronic device architectures such as field effect transistors applications. With a typical carrier concentration of about 1E20-1E21 cm-3 at room temperature and as a new type of unsaturated linear magnetoresistive material, Tungsten Ditelluride series material obtained by hydrothermal/solvothermal method and self-fluxing method has potential applications in the fields of strong magnetic detection, information recording and magnetic storage devices.Single Crystal Tungsten Telluride is grown by highly sophisticated float zone technique to drive out defects intentionally during the growth process to achieve defect free and environmentally stable WTe2 crystals.